Cover; In situcharacterization ofthin film growth; Copyright; Contents; Contributor contact details; Part I Electron diffraction techniques for studying thin film growth in situ; 1 Reflection high-energy electron diffraction (RHEED) for in situ characterization of thin film growth; 1.1 Reflection high-energy electron diffraction (RHEED) and pulsed laser deposition (PLD); 1.2 Basic principles of RHEED; 1.3 Analysis of typical RHEED patterns: the influence of surface disorder; 1.4 Crystal growth: kinetics vs thermodynamics; 1.5 Variations of the specular intensity during deposition.
1.6 Kinetical growth modes and the intensity response in RHEED1.7 RHEED intensity variations and Monte Carlo simulations; 1.8 Conclusions; 1.9 Acknowledgements; 1.10 References; 2 Inelastic scattering techniques for in situ characterization of thin film growth: backscatter Kikuchi diffraction; 2.1 Introduction; 2.2 Kikuchi patterns; 2.3 Kikuchi lines in reflection high-energy electron diffraction (RHEED) images; 2.4 Dual-screen RHEED and Kikuchi pattern collection; 2.5 Lattice parameter determination; 2.6 Epitaxial film strain determination; 2.7 Kinematic and dynamic scattering.
2.8 Epitaxial film structure determination2.9 Conclusion; 2.10 References; Part II Photoemission techniques for studying thin film growth in situ; 3 Ultraviolet photoemission spectroscopy (UPS) for in situ characterization of thin film growth; 3.1 Introduction; 3.2 Principles of ultraviolet photoemission spectroscopy (UPS); 3.3 Applications of UPS to thin film systems; 3.4 Future trends; 3.5 References; 4 X-ray photoelectron spectroscopy (XPS) for in situ characterization of thin film growth; 4.1 Introduction; 4.2 In situ monitoring of thin film growth.
4.3 Measuring the reaction of thin films with gases using ambient pressure X-ray photoelectron spectroscopy (XPS)4.4 In situ measurements of buried interfaces using high kinetic energy XPS (HAXPES); 4.5 Conclusions; 4.6 Acknowledgments; 4.7 References; 5 In situ spectroscopic ellipsometry (SE) for characterization of thin film growth; 5.1 Introduction; 5.2 Principles of ellipsometry; 5.3 In situ spectroscopic ellipsometry (SE) characterization; 5.4 In situ considerations; 5.5 Further In situ SE examples; 5.6 Conclusions; 5.7 Sources of further information and advice; 5.8 Acknowledgments.
5.9 ReferencesPart III Alternative in situ characterization techniques; 6 In situ ion beam surface characterization of thin multicomponent films; 6.1 Introduction; 6.2 Background to ion backscattering spectrometry and time-of-flight (TOF) ion scattering and recoil methods; 6.3 Experimental set-ups; 6.4 Studies of film growth processes relevant to multicomponent oxides; 6.5 Conclusions; 6.6 Acknowledgments; 6.7 References; 7 Spectroscopies combined with reflection high-energy electron diffraction (RHEED) for real-time in situ surface monitoring of thin film growth; 7.1 Introduction.
